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29
Cu
63.55

Copper

Element density: 8.92 g/cm3
Electron configuration:

[Ar]3d104s1

Oxidation states: +1,2

Major edges

What are these symbols?
K8979
L2951
L3931
M2374

Minor edges

L11097
M1120

Considerations

Rich ELNES structure in L2,3-edges. White line ratio and energy shift used to determine oxidation state. Metallic state does not have white lines due to filling of d-state. White line appearance is sensitive measure of initial oxidation.

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Related spectral data

DM Data
MSA Data

CuO thin film_0-1930eV

Material analyzed:

CuO

Related elements: Copper Oxygen
Data contributor: Gatan Beam energy (keV): 1 Nominal energy range (eV): 0 - 1930 Collection semi-angle effective (mrad): 100
Notes:

Serial EELS; 100 sweeps 20 ms dwell

DM Data
MSA Data

Cu metal thin film_0820-1320eV

Material analyzed:

Cu

Related elements: Copper
Data contributor: Gatan Beam energy (keV): 1 Nominal energy range (eV): 820 - 1320 Collection semi-angle effective (mrad): 0
Notes:

Serial EELS; 1 sweep 500 ms dwell

DM Data
MSA Data

Cu thin film_0-1930eV

Material analyzed:

Cu

Related elements: Copper
Data contributor: Gatan Beam energy (keV): 200 Nominal energy range (eV): 0 - 1930 Collection semi-angle effective (mrad): 100
Notes:

Serial EELS; 90 sweeps 20 ms dwell

DM Data
MSA Data

Cu thin film_0-0170eV

Material analyzed:

Cu

Related elements: Copper
Data contributor: Gatan Beam energy (keV): 1 Nominal energy range (eV): 0 - 170 Collection semi-angle effective (mrad): 2
Notes:

Serial EELS; not in atlas; 15 sweeps 20 ms dwell; analog only

DM Data
MSA Data

Cu thin film_0-0180eV

Material analyzed:

Cu

Related elements: Copper
Data contributor: Gatan Beam energy (keV): 200 Nominal energy range (eV): 0 - 180 Collection semi-angle effective (mrad): 100
Notes:

Serial EELS; 15 sweeps 16.67 ms dwell