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28 NiNickel58.6934

Nickel

Element Density: 8.908 g/cm³

Electron Configuration:

[Ar]3d⁸4s²

Oxidation States: +2,3

Major Edges
K	8333
L₂	872
L₃	855
M₂₃	68

Minor Edges
L₁	1008
M₁	112

Considerations

Rich ELNES structure in L_2,3-edges. White line ratio and energy shift used to determine oxidation state.

NiO thin film_0-0960eV

Material Analyzed:
NiO
Related Elements:Nickel, Oxygen
Data Contributor:Gatan
Beam energy (keV):200
Nominal energy range (eV):0 - 960
Collection semi-angle effective (mrad):100
Notes:
Serial EELS; zero-loss peak intensity = 7.50e⁹; total elastic int. / zero-loss int. = 0.47; gain change factor = 1073; 220 sweeps 20 ms dwell

NiO thin film_0-180eV

Material Analyzed:
NiO
Related Elements:Nickel, Oxygen
Data Contributor:Gatan
Beam energy (keV):200
Nominal energy range (eV):400 - 1410
Collection semi-angle effective (mrad):1.5
Notes:
Serial EELS; 30 sweeps 20 ms dwell

NiO thin film_0-180eV

Material Analyzed:
NiO
Related Elements:Nickel, Oxygen
Data Contributor:Gatan
Beam energy (keV):200
Nominal energy range (eV):0 - 180
Collection semi-angle effective (mrad):100
Notes:
Serial EELS; 20 sweeps 20 ms dwell