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28 NiNickel58.6934

Nickel

Element Density: 8.908 g/cm3
Electron Configuration:
[Ar]3d84s2
Oxidation States: +2,3
Major Edges
K8333
L2872
L3855
M2368
Minor Edges
L11008
M1112

Considerations

Rich ELNES structure in L2,3-edges. White line ratio and energy shift used to determine oxidation state.

NiO thin film_0-0960eV

  • Material Analyzed:
    NiO
  • Related Elements:Nickel, Oxygen
  • Data Contributor:Gatan
  • Beam energy (keV):200
  • Nominal energy range (eV):0 - 960
  • Collection semi-angle effective (mrad):100
  • Notes:

    Serial EELS; zero-loss peak intensity = 7.50e9; total elastic int. / zero-loss int. = 0.47; gain change factor = 1073; 220 sweeps 20 ms dwell

NiO thin film_0-180eV

  • Material Analyzed:
    NiO
  • Related Elements:Nickel, Oxygen
  • Data Contributor:Gatan
  • Beam energy (keV):200
  • Nominal energy range (eV):400 - 1410
  • Collection semi-angle effective (mrad):1.5
  • Notes:

    Serial EELS; 30 sweeps 20 ms dwell

NiO thin film_0-180eV

  • Material Analyzed:
    NiO
  • Related Elements:Nickel, Oxygen
  • Data Contributor:Gatan
  • Beam energy (keV):200
  • Nominal energy range (eV):0 - 180
  • Collection semi-angle effective (mrad):100
  • Notes:

    Serial EELS; 20 sweeps 20 ms dwell