The table below begins to capture the main usage features of each technique.

	EELS	EDS	XPS	Auger	CL
Probe → Signal	e- → e-	e- → \(\gamma\)	\(\gamma\) → e-	e- → e-	e- → \(hv\)
Sample requirements	Thin (<1 – 2 mfp) for best results	Semi-thin to bulk Flat surface for bulk	Bulk – Ultra-high vacuum (UHV) compatible Flat surface	Semi-thin to bulk – UHV compatible Flat surface for bulk Non-charging	Semi-thin to bulk Optically active
Technique	Requires setup of electron optics	Minimal setup	UHV handling	UHV handling Methods to reduce charging	Requires setup of spectrometer
Composition analysis	No standards for analysis			Compare to standards	N/A
Chemical analysis	Fingerprinting/energy shift	None	Fingerprinting	Limited	Depends on material